Welcome!
ALERT ATTENTION ⚠️
In Observance of U.S. Holiday, Memorial Day, Agilent Cross Lab/ iLab Operations Software Support Help Desk will be closed during U.S. hours on Monday May 30th, 2022. We will resume regular U.S. support hours on Tuesday May 31st, 2022. EU and APAC Support will remain open during this time. For urgent matters, please add "Urgent" to the ticket/ email subject or press "1", when prompted, to escalate a call on the iLab Support phone and we will prioritize those requests first.
Wet and dry etch capabilities can be applied to almost any materials used in the cleanroom. Two deep reactive ion etchers (DRIE), two bosch silicon etchers, a simple reactive ion etcher, and an oxygen barrel asher anchor the dry-etching capabilities. Several conventional acid and solvent hoods, as well as two high temperature-acid hoods, provide space for wet etches and cleans.
Francis Manfred, Research Engineer
fmanfred@purdue.edu
| Hours | Location |
|
Monday - Friday 9:00 am - 5:00 pm |
Birck Nanotechnology Center 1205 West State Street West Lafayette, IN 47907-2057 |
**For Purdue individuals: First-time users should click "Sign-up" in upper right. Returning students will click "Login"
**For Non-Purdue individuals: Before you register, you must be assigned a Business Partner Number and given Purdue credentials to register/login.
Please contact the center manager for further information.
| Name | Role | Phone | Location | |
|---|---|---|---|---|
| Francis Manfred |
Research Engineer
|
7654943480
|
fmanfred@purdue.edu
|
2287B
|
