BRK Etch Core

Overview of Services

Wet and dry etch capabilities can be applied to almost any materials used in the cleanroom. Two deep reactive ion etchers (DRIE), two bosch silicon etchers, a simple reactive ion etcher, and an oxygen barrel asher anchor the dry-etching capabilities. Several conventional acid and solvent hoods, as well as two high temperature-acid hoods, provide space for wet etches and cleans. 

Leadership

Francis Manfred, Research Engineer

fmanfred@purdue.edu

Location and Hours of Operation

Hours Location

Monday - Friday

9:00 am - 5:00 pm           

Birck Nanotechnology Center

1205 West State Street

West Lafayette, IN 47907-2057

Getting Started

**For Purdue individuals: First-time users should click "Sign-up" in upper right.  Returning students will click "Login"

 

**For Non-Purdue individuals: Before you register, you must be assigned a Business Partner Number and given Purdue credentials to register/login.  

Please contact the center manager for further information.

Links and Resources

  1. Purdue University Discovery Park - Birck Nanotechnology Center
  2. nanoHUB
  3. Purdue University - Purdue e-Pubs
  4. Purdue University Discovery Park - Birck Nanotechnology Center, Research
  5. BNC Safe Systems
  6. Equipment Installation Manual
  7. Birck Policy & Procedures
  8. Birck Emergency Plan

Contacts

Name Role Phone Email Location
Francis Manfred
Research Engineer
 
7654943480
 
fmanfred@purdue.edu
 
2287B